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Horizontal PECVD Equipment (Poly-Si)

PRODUCTS AND SERVICES > Horizontal Furnaces Series > Horizontal PECVD Equipment (Poly-Si)

Horizontal PECVD Equipment (Poly-Si)

  Features  

·The tunnel oxide layer, i-poly, and D-poly layers can be coated in the same furnace tube which helps in reducing the process steps, improving the yield and lowering the breakage rate effectively;

·Without hot wall effects, so quartz tube has a long service life;

·Slight wrap-around deposition which is easy to be removed;

·Precise doping; available to introduce other efficiency-enhancing doping elements, suitable for process expansion and large space for efficiency improvement;

·Patented anti-conduction technology.